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ISO 23170:2022

ISO 23170:2022 Surface chemical analysis - Depth profiling - Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

standard by International Organization for Standardization, 07/01/2022

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This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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Published: 07/01/2022 Number of Pages: 36 File Size: 1 file , 3.5 MB Same As: BS ISO 23170:2022 Note: This product is unavailable in Ukraine, Russia, Belarus

 
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